Morphology Transition during Low Pressure Chemical Vapor Deposition
Published in Phys. Rev. Lett. 87, 2001
In this paper, we show that for surface roughening in chemical vapor deposition system, the sticking coefficient plays a very important role. We have shown that the surface morphology changes from a self-affine fractal to a columnar-like morphology with increasing sticking coefficient, which agrees qualitatively with experimental observations. We also observed that scaling exponents and universality classes might not have a one-to-one correspondence.
Fig. 1 The simulated growth morphology for different zeroth-order sticking coefficients for first-order re-emission.
Fig. 2 The extracted growth exponent b and roughness exponent a from the height-height correlation function plotted as a function of sticking coefficient for first-order and all-order re-emission. These two cases form the upper and lower extremes for finite-order re-emission process. Exponents for finite-order re-emission should fall in the shaded area.